PUBLICATIONS
As one of the world's leading centres for photomasks of the latest generation, the AMTC focuses its activities on research and development in the photomask and semiconductor industry. The results of the R&D activities are presented at international conferences.
Publications containing AMTC-related research results are listed below.
Publications
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Special awards
Photomask Technology 2018: Best Poster
Multiple exposure on single blank for electron-beam writer characterization
EMLC 2017: Best Paper
Splendidly blended: a machine learning set up for CDU control
Photomask Technology 2011: 2nd place at best paper award
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Publications - 2023
Proceedings Paper + Presentation | 21 November 2023
Mask error and its contribution to OPC model error for an EUV via layer
Proceedings Paper | 5 October 2023
Divide et impera: a short talk about the importance of feature and model engineering
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Publications - 2022
pending
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Publications - 2021
Proceedings Paper + Presentation | 12 October 2021
3D-MC modelling of particle contamination induced defects in ebeam mask writing
Proceedings Paper | 23 August 2021
Stability of CD off-target: analysis
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Publications - 2020
pending
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Publications - 2019
Proceedings Paper + Presentation | 26 September 2019
Loading effect correction set up by supplementing CD measurement analysis with machine learning
Proceedings Paper | 29 August 2019
Necessity is the mother of invention: support vector machines for CD control
Proceedings Paper | 27 June 2019
Proceedings Paper | 27 June 2019
Deal gently with the bird you are trying to catch: small scale CD control with machine learning
Proceedings Paper | 27 June 2019
Lifetime test on EUV photomask with EBL2
Proceedings Paper + Presentation | 1 May 2019
Experimental Investigation of a high-κ reticle absorber system for EUV lithography
Proceedings Paper + Presentation | 26 March 2019
Towards ultimate image placement accuracy for EUV mask writing with pattern shift process
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Publications - 2018
Proceedings Paper + Presentation | 12 November 2018
Mask process correction validation for multi-beam mask lithography
Proceedings Presentation | 12 October 2018
Minimizing tone reversal during 19x nm mask inspection: PMJ18 Best Paper (Conference Presentation)
Proceedings Paper + Presentation | 3 October 2018
Proceedings Paper + Presentation | 3 October 2018
Multiple exposure on single blank for electron-beam writer characterization
Proceedings Paper | 3 October 2018
Applying MPC for EUV mask fabrication
Proceedings Paper | 19 September 2018
Deposition durability of e-beam mask repair
Proceedings Paper | 19 September 2018
Machine learning methods applied to process qualification
Proceedings Paper + Presentation | 2 August 2018
Proceedings Paper | 12 June 2018
Minimizing "Tone Reversal" during 19x nm mask inspection
Proceedings Paper | 12 June 2018
Proceedings Paper | 20 March 2018
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Publications - 2017
Proceedings Paper | 28 September 2017
Splendidly blended: a machine learning set up for CDU control
Proceedings Paper | 28 September 2017
Half circle chrome loss by electrochemical effects
Proceedings Paper | 13 July 2017
EUV repair process optimization and integration
Proceedings Paper | 13 July 2017
Effects of hard mask etch on final topography of advanced phase shift masks
Proceedings Paper | 13 July 2017
Etch bias inversion during EUV mask ARC etch